Session 4A-5

Impact of Mobility Boosters (XsSOI, CESL, TiN Gate) on the Performance of ‹100› or ‹100›
Oriented FDSOI cMOSFETs for the 32nm Node

 

Abstract

For the first time, we integrated 1.9GPa eXtra-strained Silicon On Insulator (XsSOI) substrates in FDSOI n and pMOSFETs with gate length (LG) and width (W) down to 25nm. Significant ION-IOFF improvements were obtained not only for nMOS but also for pMOS. We compared those results with the performance of devices strained by Contact Etch Stop Layer (CESL), for different device orientations and feature sizes. We demonstrate that, similarly to XsSOI, a single tensile CESL can improve both n and pMOS performance, leading to ION,n=0.700 mA/micron and ION,p=0.430mA/micron at IOFF=140pA/micron, this for LG below 35nm, W=50nm and VDD=1V.