Session 6A-3

Design Enablement for Yield and Area Optimization at 20 nm and Below

Abstract

There are challenges at 20nm and below to maintain node to node area reduction and also enable a fast yield ramp and high yield to enable cost scaling. GLOBALFOUNDRIES uses special constructs to reduce cell area along with rule based, model based and pattern based design for manufacturing (feedback from manufacturing to design) and design enabled manufacturing (feed forward from design to manufacturing) in order to achieve these goals.