Sunday Workshop 1
Workshop on Impact of Atomic Layer Processing and Selective Area Patterning on Device Fabrication and Performance
Several specialists are invited to each workshop. This will be a great opportunity for you to acquire new knowledge and to expand your networks. Please arrange your schedule to be in Kyoto on Sunday evening and enjoy this new event.
Committee:
Gottlieb Oehrlein – University of Maryland
Craig Huffman – Micron
Dennis Hausmann – LAM Research
Sumit Agarwal – Colorado School of Mines
This workshop is co-sponsored by American Vacuum Society (AVS).
Abstract / objectives:
The workshop is going to highlight new capability in the field of Atomic Layer Etching, Atomic
Layer Deposition and Selective Area Patterning which are of interest to the semiconductor device
community for the enablement of future device fabrication technology.
| Tittle | Speaker Organization |
Time | |
|---|---|---|---|
| Session 1 | Effect of ALE on Semiconductor Device Properties | Geun-Young Yeom Sungkyunkwan Univ. |
19:00 |
| Surface Reaction Analyses for Atomic Scale Processing by Beam Experiments | Kazuhiro Karahashi Osaka Univ. |
19:25 | |
| Selective and Self-Limited Thin Film Processes for the Atomic Scale Era | Rob Clark TEL |
19:50 | |
| 15 minutes Break | 20:15 | ||
| Session 2 | Plasma-Based Selective Atomic Layer Deposition and Etching to Enable 5nm and Beyond Device Technology | Erwin Kessels Eindhoven Univ. of Tech. |
20:30 |
| Selective Deposition: The Devil is in the Defects | Hui Jae Yoo Intel |
20:55 | |
| Creating 3D Nanoscale Structures by Area-Selective Deposition | Annelies Delabie KU Leuven / imec |
21:20 | |