Sunday, June 11 |
5:00p-7:00p |
Registration |
Monday, June 12 |
8:00a-5:00p |
Registration |
8:30a-5:15p |
Short Course |
7:00p-9:00p |
Reception |
Tuesday, June 13 |
7:30a-5:30p |
Registration |
8:00a-10:00a |
Session 1 |
Opening and Plenary Session |
10:15a-11:55p |
Session 2 |
Advanced High K Metal Gate Stacks Integration |
Session 3 |
Advanced Flash Memory |
1:30p-3:10p | Session 4 |
Advanced Gate Dielectric Reliability |
Session 5 |
Advanced Dynamic Memory |
3:25p-5:30p | Session 6 |
Non-Volatile Trapped Charge Memory |
Session 7 |
Multi-Gate FETs |
7:00p-9:00p |
Technology Symposium Banquet |
Wednesday, June 14 |
7:30a-5:00p |
Registration |
8:30a-10:10a | Session 8 |
Strain Enhanced CMOS I |
Session 9 |
High Speed Memory Technology |
10:25a-12:05p | Session 10 |
Mobility Enhancement on Process Induced Strain |
Session 11 |
Non-Volatile FinFet Flash Memory |
1:30p-3:10p | Session 12 |
Advanced FUSI Gates Stacks |
Session 13 |
Analog/RF/Mixed-Signal VLSI |
3:25p-5:30p | Session 14 |
Advanced Interconnect Technology |
Session 15 |
Alternative Non-Volatile Memory |
8:00p-10:00p |
Rump Sessions |
Thursday, June 15 |
7:30a-5:00p |
Registration |
8:30a-10:10a |
Session 16 |
Strain Enhanced CMOS-II |
Session 17 |
Novel Architectures and Process Integration |
10:25a-12:05p | Session 18 |
Strain Enhanced High Performance PMOS Devices |
Session 19 |
Advanced CMOS Technology |
1:30p-3:10p | Session 20 |
Advanced High K Stacks |
Session 21 |
Front-End of Line Processing |
3:25p-5:05p | Session 22 |
Novel Gate Stacks Engineering and Characterization |
Session 23 |
Advanced Source/Drain Engineering |